{"subject":"Dielectric Materials Reactive Ion Etching System B","detailContent":"
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\"REACTIVE
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","dataClassName":"Nanofabrication","pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-20","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
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Nano Facility Center
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\r\nInstrument Information
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  1. Brand model: RIE200L made by SamCo, Japan
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  2. Purchase period: December 1, 2002
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  3. Place of placement:Laboratory 116, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55666)
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  4. Function: etching silicon dioxide, silicon nitride and other materials
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  5. Important Specifications: The RF generator can output a maximum of 300W and a frequency of 13.56MHz. The etching system can enter CF4, O2, SF6, CHF3 and other gases to etch materials such as silicon dioxide and silicon nitride.
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  6. The instrument can be used with special process material.
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","page2Title":"Precautions","page2":"
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Precautions
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  1. Please explain in detail what substances are contained on the substrate (such as SiO2, Si3N4, Metal, photoresist, etc.).
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  2. If there are no special requirements for etching, it will be done according to the central standard process:\r\n\t
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    • SiOx : (RIE mode) 300 ~400 Å/min 100W,4Pa.
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    • SiNx : (RIE mode) 900~1000 Å/min 100W,4Pa.
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  3. The wafer shall not contain Ag, Au, Cu, Fe, Ni, Zn, LiNbO3, In, Pb, Sn, ITO and other components.
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  4. Metal must not be exposed.
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","page3Title":"Do-it-yourself regulations","page3":"
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self-operated instrument
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  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
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  2. Instrument opening level and number of people.
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  3. After you have the permission to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
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","page4Title":"Delegated Operation Regulations","page4":"
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Commissioning the operation of the instrument
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  1. If there is a National Academy of Sciences, please come first to NSTC Basic Research Core Facility Reservation Service Management System (https://vir.nstc.gov.tw/home/Index). Make an appointment and get the appointment number, then download the RIE 200L OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
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  2. For those without an NSTC project, please download the RIE 200L OEM Application Form directly, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
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","page5Title":"Charges","page5":"
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Charge information
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  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
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  2. charging method\r\n\t
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    • Do it yourself: charge a fee
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    • Entrusted operation: charging usage fee + OEM fee
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  3. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
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","page6Title":"References","page6":"
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2022 Yangming Jiaotong University Instrument Resource Center Basic Research Core Facilities Online Technology Sharing Conference Video
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","page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://ord.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1168731341475287040&init=Y","expFile":"REACTIVE ION ETCHING SYSTEM FOR DIELECTRIC MATERIALS B"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=cbb45d9b-627f-4b3f-8d7d-f51c4c51ee6a","relateName":"Dielectric Active Ion Etching System A"}]}