<MachineOpenDataModel><subject>&lt;![CDATA[Dielectric Active Ion Etching System A]]&gt;</subject><detailContent>&lt;![CDATA[&lt;div class="ed_model05 clearfix">&#xd;
&lt;div class="ed_pic_right">&lt;img alt="Dielectric Active Ion Etching System A" src="/ord/en/app/machine/image?module=corefacilities&amp;amp;detailNo=1168734453216841728&amp;amp;init=N" />&lt;/div>&#xd;
&#xd;
&lt;div class="ed_list">&#xd;
&lt;ul>&#xd;
	&lt;li>&lt;a href="https://nanofc.web.nycu.edu.tw/%e4%bb%8b%e9%9b%bb%e6%9d%90%e6%96%99%e6%b4%bb%e6%80%a7%e9%9b%a2%e5%ad%90%e8%9d%95%e5%88%bb%e7%b3%bb%e7%b5%b1-adielectric-materials-reactive-ion-etching-system-rie-400ip/" rel="noreferrer noopener" target="_blank" title="Dielectric Materials Reactive Ion Etching System, RIE-400iP(Open New Windows)">&lt;strong>Dielectric Materials Reactive Ion Etching System, RIE-400iP&lt;/strong>&lt;/a>&lt;br />&#xd;
	Brand model: RIE-400iP made by SamCo, Japan&lt;/li>&#xd;
	&lt;li>&lt;strong>Instrument expert: Prof.&amp;nbsp;Tsui, Bing-Yue&lt;/strong>&lt;br />&#xd;
	03-5712121 ext 31570&lt;/li>&#xd;
	&lt;li>&lt;strong>Equipment management personnel: Mr.&amp;nbsp;Hu, Jack&lt;/strong>&lt;br />&#xd;
	03-5712121 ext&amp;nbsp;55607, 55666&lt;br />&#xd;
	Email &lt;a href="mailto:jackhu@nycu.edu.tw" title="jackhu@nycu.edu.tw">jackhu@nycu.edu.tw&lt;/a>&lt;/li>&#xd;
	&lt;li>&lt;strong>Equipment management personnel: Mr.&lt;/strong> &lt;strong>Lee, James&lt;/strong>&lt;br />&#xd;
	03-5712121 ext&amp;nbsp;55660, 55666&lt;br />&#xd;
	Email &lt;a href="mailto:cwlee@nycu.edu.tw" title="cwlee@nycu.edu.tw">cwlee@nycu.edu.tw&lt;/a>&lt;/li>&#xd;
	&lt;li>&lt;strong>Instrument location: Laboratory 121, 1st Floor, Solid State Electronic Systems Building,&amp;nbsp;Guanfu Campus&lt;/strong>&lt;/li>&#xd;
&lt;/ul>&#xd;
&lt;/div>&#xd;
&lt;/div>]]&gt;</detailContent><dataClassName>Nanofabrication</dataClassName><pubUnitName>Instrumentation Resource Center                                                                     </pubUnitName><posterDate/><updateDate>2026-05-20</updateDate><liaisonper/><liaisontel/><liaisonfax/><liaisonemail/><languageurl/><page1Title>Instrument introduction</page1Title><page1>&lt;div class="ed_model01 clearfix">&#xd;
&lt;div class="ed_txt">&lt;strong>&lt;a href="https://nanofc2.web.nycu.edu.tw/dielectric-materials-reactive-ion-etching-system-rie-400ip-1/" title="Link to Nano Center Introduction Page">Nano Facility Center&lt;/a>&lt;br />&#xd;
Instrument Information&lt;/strong>&lt;/div>&#xd;
&#xd;
&lt;ol>&#xd;
	&lt;li>Brand model: RIE-400iP manufactured by SamCo Corporation of Japan.&lt;/li>&#xd;
	&lt;li>Purchase period: March 4, 2019.&lt;/li>&#xd;
	&lt;li>Location: Laboratory 121, 1st Floor, Solid State Electronic Systems Building,&amp;nbsp;Guanfu Campus&amp;nbsp;(TEL: 55610).&amp;nbsp;&amp;nbsp;&amp;nbsp;&lt;/li>&#xd;
	&lt;li>Function: dry etching, mainly etching silicon carbide (SiC), and can etch dielectric (SiO&lt;sub>2&lt;/sub>, Si&lt;sub>3&lt;/sub>N&lt;sub>4&lt;/sub>) material, 4&amp;Prime; wafer-based.&lt;/li>&#xd;
	&lt;li>Important specifications: This etching system can be fed with C4F8, O2, SF6, CHF3 and other gases to etch silicon carbide (SiC) and dielectric (SiO&lt;sub>2&lt;/sub>, Si&lt;sub>3&lt;/sub>N&lt;sub>4&lt;/sub>).&lt;/li>&#xd;
	&lt;li>The instrument can be used with&amp;nbsp;&lt;a href="/userfiles/orden/files/20240612093306812.pdf" rel="noreferrer noopener" target="_blank" title="special process material(pdf)(Open New Windows)">special process material&lt;/a>.&lt;/li>&#xd;
&lt;/ol>&#xd;
&lt;/div></page1><page2Title>Precautions</page2Title><page2>&lt;div class="ed_model01 clearfix">&#xd;
&lt;div class="ed_txt">&lt;strong>Precautions&lt;/strong>&lt;/div>&#xd;
&#xd;
&lt;ol>&#xd;
	&lt;li>Material Restrictions:&#xd;
	&lt;ul>&#xd;
		&lt;li>(1) Limited to silicon carbide (SiC) substrates and Si substrates.&lt;/li>&#xd;
		&lt;li>(2). The test piece shall not be doped with metal elements or plated with metal films.&lt;/li>&#xd;
		&lt;li>(3). The test piece shall not pass through the post-processing machine.&lt;/li>&#xd;
	&lt;/ul>&#xd;
	&lt;/li>&#xd;
	&lt;li>Please explain in detail what substances are on the substrate (such as Poly-Si, SiO2, Si3N4, photoresist, etc.), and whether to clean the wafer.&lt;/li>&#xd;
	&lt;li>If there is no special requirement for etching, it will be done according to the standard process parameters of the center.&lt;/li>&#xd;
&lt;/ol>&#xd;
&lt;/div></page2><page3Title>Do-it-yourself regulations</page3Title><page3>&lt;div class="ed_model01 clearfix">&#xd;
&lt;div class="ed_txt">&lt;strong>self-operated instrument&lt;/strong>&lt;/div>&#xd;
&#xd;
&lt;ol>&#xd;
	&lt;li>Instructions for obtaining the permission to use the instrument:&#xd;
	&lt;ul>&#xd;
		&lt;li>&lt;a href="https://nanofc.web.nycu.edu.tw/%e5%a5%88%e7%b1%b3%e4%b8%ad%e5%bf%83%e7%94%b3%e8%ab%8b%e6%b5%81%e7%a8%8b/" rel="noreferrer noopener" target="_blank" title="Daytime permission application process description(Open New Windows)">Daytime permission application process description&lt;/a>&amp;nbsp;(Using permission is Monday to Friday 8:00~17:00)&lt;/li>&#xd;
		&lt;li>&lt;a href="https://nanofc.web.nycu.edu.tw/24%e5%b0%8f%e6%99%82%e5%90%ab%e5%81%87%e6%97%a5%e9%96%80%e7%a6%81%e5%8f%8a%e8%a8%ad%e5%82%99%e6%ac%8a%e9%99%90%e7%94%b3%e8%ab%8b%e6%b5%81%e7%a8%8b/" rel="noreferrer noopener" target="_blank" title="24-hour application process description(Open New Windows)">24-hour application process description&lt;/a>&amp;nbsp;(You need to have daytime permission to apply)&lt;/li>&#xd;
		&lt;li>&lt;a href="https://nanofc.web.nycu.edu.tw/%e5%84%80%e5%99%a8%e7%94%b3%e8%ab%8b%e6%b3%a8%e6%84%8f%e4%ba%8b%e9%a0%85/" rel="noreferrer noopener" target="_blank" title="Precautions(Open New Windows)">Precautions&lt;/a>&amp;nbsp;(Be sure to read carefully, so as not to lose your own rights)&lt;/li>&#xd;
		&lt;li>RIE-400iP instrument&amp;nbsp;&lt;a href="/userfiles/orden/files/20240612093358820.pdf" rel="noreferrer noopener" target="_blank" title="Operating Specifications(pdf)(Open New Windows)">Operating Specification&lt;/a>s&amp;nbsp;&amp;amp;&amp;nbsp;&lt;a href="/userfiles/orden/files/20240612093418056.pdf" rel="noreferrer noopener" target="_blank" title="Exam record sheet(pdf)(Open New Windows)">Exam record sheet&lt;/a>&lt;/li>&#xd;
	&lt;/ul>&#xd;
	&lt;/li>&#xd;
	&lt;li>&lt;a href="https://nanofc.web.nycu.edu.tw/%e5%84%80%e5%99%a8%e9%96%8b%e6%94%be%e7%ad%89%e7%b4%9a%e3%80%81%e4%ba%ba%e6%95%b8%e3%80%81%e8%a8%93%e7%b7%b4%e6%ac%a1%e6%95%b8open-level-open-people-training-times/" rel="noreferrer noopener" target="_blank" title="Instrument opening level and number of people.(Open New Windows)">Instrument opening level and number of people.&lt;/a>&lt;/li>&#xd;
	&lt;li>After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:&#xd;
	&lt;ul>&#xd;
		&lt;li>NSTC&amp;nbsp;Basic Research Core Facility Reservation Service Management System&amp;nbsp;(get serial number)&lt;/li>&#xd;
		&lt;li>&lt;a href="https://nfcmachin.ece.nycu.edu.tw/" rel="noreferrer noopener" target="_blank" title="Nano Center Instrument Reservation System(Open New Windows)">Nano Center Instrument Reservation System&lt;/a>&amp;nbsp;(Use time slot reservation)&lt;/li>&#xd;
	&lt;/ul>&#xd;
	&lt;/li>&#xd;
&lt;/ol>&#xd;
&lt;/div></page3><page4Title>Delegated Operation Regulations</page4Title><page4>&lt;div class="ed_model01 clearfix">&#xd;
&lt;div class="ed_txt">&lt;strong>Commissioning the operation of the instrument&lt;/strong>&lt;/div>&#xd;
&#xd;
&lt;ol>&#xd;
	&lt;li>If there is a National Academy of Sciences, please come first&amp;nbsp;NSTC&amp;nbsp;Basic Research Core Facility Reservation Service Management System&amp;nbsp;(https://vir.nstc.gov.tw/home/Index)Make an appointment and get the appointment number, then download&amp;nbsp;&lt;a href="/userfiles/orden/files/20240612093433796.odt" rel="noreferrer noopener" target="_blank" title="RIE-400iP OEM Application Form(odt)(Open New Windows)">RIE-400iP OEM Application Form&lt;/a>, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.&lt;/li>&#xd;
	&lt;li>For those without an NSTC project, please download directly&amp;nbsp;&lt;a href="/userfiles/orden/files/20240612093433796.odt" rel="noreferrer noopener" target="_blank" title="RIE-400iP OEM Application Form(odt)(Open New Windows)">RIE-400iP OEM Application Form&lt;/a>, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling the RIE-400iP OEM Application Form directlyOEM.&lt;/li>&#xd;
&lt;/ol>&#xd;
&lt;/div></page4><page5Title>Charges</page5Title><page5>&lt;div class="ed_model01 clearfix">&#xd;
&lt;div class="ed_txt">&lt;strong>Charge information&lt;/strong>&lt;/div>&#xd;
&#xd;
&lt;ol>&#xd;
	&lt;li class="ed_txt">&lt;span style="color:#ff0000;">&lt;strong>Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.&lt;/strong>&lt;/span>&lt;/li>&#xd;
	&lt;li class="ed_txt">charging method&#xd;
	&lt;ul>&#xd;
		&lt;li class="ed_txt">Do it yourself: charge a fee&lt;/li>&#xd;
		&lt;li class="ed_txt">Entrusted operation: charging usage fee + OEM fee&lt;/li>&#xd;
	&lt;/ul>&#xd;
	&lt;/li>&#xd;
	&lt;li class="ed_txt">Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1&lt;/li>&#xd;
&lt;/ol>&#xd;
&lt;/div></page5><page6Title>References</page6Title><page6>&lt;div class="ed_model01 clearfix">&#xd;
&lt;div class="ed_txt">&lt;a href="https://irc.ord.nycu.edu.tw/en/news/pc_news/20220810-nstc/" rel="noreferrer noopener" target="_blank" title="2022 Yangming Jiaotong University Instrument Resource Center Basic Research Core Facilities Online Technology Sharing Conference Video(Open New Windows)">2022 Yangming Jiaotong University Instrument Resource Center Basic Research Core Facilities Online Technology Sharing Conference Video&lt;/a>&lt;/div>&#xd;
&lt;/div></page6><page7Title/><page7/><page8Title/><page8/><docs/><images><images><fileurl>https://ord.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&amp;detailNo=1168734453216841728&amp;init=Y</fileurl><expFile>Dielectric Active Ion Etching System A</expFile></images></images><videos/><audios/><resources><resources><relateURL>https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&amp;id=1990</relateURL><relateName>List of Instruments</relateName></resources><resources><relateURL>https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&amp;id=1992</relateURL><relateName>Basic Service-Nanofabrication</relateName></resources><resources><relateURL>https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&amp;id=1990&amp;serno=09960a93-175f-47a7-ae1f-082eec10162b</relateURL><relateName>Dielectric Materials Reactive Ion Etching System B</relateName></resources></resources></MachineOpenDataModel>