{"subject":"[Guangfu] Manual Mask Aligner","detailContent":"
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\"Manual
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","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-03-06","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Introduction","page1":"
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Instrument brand, model, year of purchase
\r\nBrand:  Chian Chyi Jeng Technology
\r\nModel:  CM-4-LED
\r\nYear of Purchase: 2023.12
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\r\nImportant Specifications
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  1. Light Source: 365 nm UV LED
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  2. Wavelength: I-line 365 nm   
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  3. Illuminance: ≥ 20 mW/cm² (I-line)
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  4. Power Supply Operating Mode: Constant Voltage (CP mode)
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  5. Mask Size: 127 × 127 mm mask holder (bottom load), 1 pc
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  6. Light Source Parallelism Angle: ≤ ±2.5°
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  7. Illuminance Uniformity: ≤ ±3%
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  8. Effective Exposure Area (Collimated Light): Ø100 mm
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  9. Exposure Modes: Proximity Soft Contact & Hard Contact
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  10. Sample:  The sample stage can accommodate 4-inch wafers or broken wafer pieces
    11. \r\n
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","page2Title":"Services and Opening Hours","page2":"
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Services
\r\n    Align process:  Align and exposure
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\r\nOpening Hours
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  1.  1. Monday to Friday：09:00 ~ 16:00
    \r\n\t 2. Nights, Saturdays, and Sundays:  Closed
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","page3Title":"System Open Level","page3":"
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System opening level
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  1. General working hours: Level D
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  2. Night and holiday hours: Closed
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Level Description
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","page4Title":"Charges","page4":"
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Charging standards
 Academic UnitsResearch UnitsManufacturers
Align Process(Within 3 wafers)
\r\n\t\t\t(Not 2nd layer Align)		NT$ 1,500 NT$2,000NT$6,000
Align Process(Within 3 wafers)
\r\n\t\t\t(2nd layer Align) 		NT$2,000NT$2,500 NT$7,000
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","page5Title":"Management and Usage","page5":"
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Management and Usage Guidelines:
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  1. The usage priority of this equipment is given first to semiconductor teaching, followed by contract manufacturing.
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  2. For contract manufacturing, please contact the equipment management personnel via email in advance.
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  3.  During the second exposure step of contract manufacturing, the applicant must be present to confirm alignment positions in order to avoid disputes.
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","page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://ord.nycu.edu.tw/ord/en/app/machine/image?module=machine&detailNo=1479051161293033472&init=Y","expFile":"Manual Mask Aligner"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.edu.tw/ord/en/app/artwebsite/view?module=artwebsite&id=2021&serno=ebdd9934-00ef-4bee-9a8a-11f305100505","relateName":"Instrument List of GuanFu and Boai Campus"},{"relateURL":"https://www.nycu.edu.tw/ord/en/app/machine/list?module=machine&id=2039","relateName":"Semiconductor Process"},{"relateURL":"https://nanofc.web.nycu.edu.tw/","relateName":"Nano Facility Center"}]}