III-V Molecular Beam Epitaxy System

• Update Date：2024-02-06
• Units：Instrumentation Resource Center

Laser Pattern Generator

• Update Date：2024-06-12
• Units：Instrumentation Resource Center

Pattern Generator

• Update Date：2024-06-12
• Units：Instrumentation Resource Center

Double Side Mask Aligner (A)

• Update Date：2024-06-12
• Units：Instrumentation Resource Center

Double Side Mask Aligner (B)

• Update Date：2024-06-12
• Units：Instrumentation Resource Center

Oxidative & Diffusion Furnaces

• Update Date：2024-06-12
• Units：Instrumentation Resource Center

Low Pressure Chemical Vapor Deposition System

• Update Date：2024-06-12
• Units：Instrumentation Resource Center

Plasma-Enhanced Chemical Vapor Deposition (PECVD)

• Update Date：2024-06-12
• Units：Instrumentation Resource Center

Dielectric Active Ion Etching System A

• Update Date：2024-06-12
• Units：Instrumentation Resource Center

Dielectric Materials Reactive Ion Etching System B

• Update Date：2024-06-12
• Units：Instrumentation Resource Center

Cold Field Emission Scanning Electron Microscope & Energy Dispersive

• Update Date：2024-06-12
• Units：Instrumentation Resource Center

Dual beam [focused ion beam & electron beam] System (FIB)

• Update Date：2024-06-12
• Units：Instrumentation Resource Center

High Density Plasma Active Ion Etching System

• Update Date：2024-06-12
• Units：Instrumentation Resource Center

Si Deep-RIE

• Update Date：2024-06-12
• Units：Instrumentation Resource Center

Shallow Si RIE

• Update Date：2024-06-12
• Units：Instrumentation Resource Center