List of Instruments
中文Nanofabrication
- Update Date：2024-06-12
- Units：Instrumentation Resource Center
Low Pressure Chemical Vapor Deposition System
- Low Pressure Chemical Vapor Deposition (LPCVD)
Brand Model: SJ-10301001-1 - Instrument expert: Prof. Liu, Po-Tsun
ext 52994 - Instrument consulting and operation services: Mr. Lai, White
Extension 55606, 55616
Email white@nycu.edu.tw - Instrument location: Laboratory 127, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus
- ext 55616
- Brand Model: SJ-10301001-1
- Purchase period: December 28, 2014
- Place of placement: Laboratory 127, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55616)
- Function:
- (1).Chamber: 6″, the length of the uniform temperature zone is 600mm
- (2). Vacuum: 5*10-3 Torr
- (3). Temperature: POLY-Si-620°C, Si3N4-800°C, TEOS-700°C
- Important specs:
- (1).Poly-Si in-situ phosphine (Poly-Si in-situ PH3): Temperature: 585°C Gas: SiH4, PH3 Pressure: 500mtorr
- (2). Polycrystalline silicon and amorphous silicon deposition (poly-Si & amorphous-Si), silicon germanium deposition (SiGe): temperature: 620°C/550°C gas: SiH4, GeH4 pressure: 300mtorr
- (3). Deposition of Silicon Nitride (Si3N4): Temperature: 800°C/850°C Gas: SiH2Cl2, NH3 Pressure: 120mtorr
- (4). Deposition of TEOS: Temperature: 700°C Gas: TEOS Pressure: 120mtorr
- The instrument can be used with special process material.
self-operated instrument
- Need to haveWet BenchOnly use permission can apply to use the LPCVD system.
- Instructions for obtaining the permission to use the instrument:
- (1).Daytime permission application process description (Using permission is Monday to Friday 8:00~17:00)
- (2).24-hour application process description (You need to have daytime permission to apply)
- (3).Precautions (Be sure to read carefully, so as not to lose your own rights)
- (4).LPCVD instrument Operating Specifications & Exam record sheet
- Instrument opening level and number of people.
- After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:
- (1).National Science Council Basic Research Core Facility Reservation Service Management System (get serial number)
- (2).Nano Center Instrument Reservation System (Use time slot reservation)
Commissioning the operation of the instrument
- If there is a National Academy of Sciences, please come firstNational Science Council Basic Research Core Facility Reservation Service Management SystemMake an appointment and get the appointment number, then download LPCVD OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
- For those without a national science account, please download directly LPCVD OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
Charge information
- Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
- charging method
- Self-operation: charge start-up fee + production fee
- Entrusted operation: charge start-up fee + production fee + OEM fee
- Cost inquiry link
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